Application Note

Precise Control Of Dissolved O2 And N2 In Semiconductor Applications Using 3M Liqui-Cel Membrane Contactors

Source: 3M Separation and Purification Sciences Division
Precise Control Of Dissolved O2 And N2 In Semiconductor Applications Using Liqui-Cel® Membrane Contactors

Semiconductor manufacturers increasingly want precise control of O2 and N2 concentrations in ultrapure water. Specifically, the polishing loop of a semiconductor plant needs to control dissolved O2 to low levels of 1 ppb or 5 ppb while simultaneously controlling the dissolved N2 between 8–12 ppm.

When it comes to total gas control, 3M™ Liqui-Cel™ Membrane Contactors are able to remove dissolved O2 down to 1 ppb and then add N2 in a second stage to the desired concentration. In comparison, vacuum towers are not used to remove and then add dissolved gasses in a single system design.

VIEW THE APPLICATION NOTE!
Signing up provides unlimited access to:
Signing up provides unlimited access to:
  • Trend and Leadership Articles
  • Case Studies
  • Extensive Product Database
  • Premium Content
HELLO. PLEASE LOG IN. X

Not yet a member of Water Online? Register today.

ACCOUNT SIGN UP X
Please fill in your account details
Login Information
I'm interested in newsletter subscriptions.
ACCOUNT SIGN UP

Subscriptions

Sign up for the newsletter that brings you the industry's latest news, technologies, trends and products.

You might also want to: