Articles
Semiconductor Plant Improves Water Quality By Using Liqui-Cel® Membrane Contactors For Simultaneous Oxygen And Carbon Dioxide Removal From Water
July 11, 2007
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•Semiconductor Plant Improves Water Quality By Using Liqui-Cel® Membrane Contactors For Simultaneous Oxygen And Carbon Dioxide Removal From Water
•Semiconductor Plant Improves Water Quality By Using Liqui-Cel® Membrane Contactors For Simultaneous Oxygen And Carbon Dioxide Removal From Water
SOURCE: Membrana
•Semiconductor Plant Improves Water Quality By Using Liqui-Cel® Membrane Contactors For Simultaneous Oxygen And Carbon Dioxide Removal From Water
A semiconductor plant in Taiwan is using Liqui-Cel® Membrane Contactors to remove dissolved gas from their ultra pure water (UPW) system. The UPW system is used to purify water used in the chemical mechanical polishing process (CMP) at the fab. The water system was designed and built by United Purification Technologies in Taichung Taiwan.
The water system has two degasification stages. The first stage removes both carbon dioxide and oxygen from the water and the second stage is in the final polishing loop where additional oxygen is removed to <5 ppb.
Click Here To Download:
•Semiconductor Plant Improves Water Quality By Using Liqui-Cel® Membrane Contactors For Simultaneous Oxygen And Carbon Dioxide Removal From Water
SOURCE: Membrana
